Patterning Assistance Materials
Honeywell SLAM� 193e
A silicon-rich BARC for damascene and other advanced patterning applications
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Overview
- Gapfill + Mask + BARC: Low CoO
- First commercial SiBARC (130-5 nm)
Product Number
Image
SKU
Description
107102
SLAM193e150F10N 125L US
107102
SLAM193e150F10N 125L US
31061160B
SLAM 1931500300mm
31061160B
SLAM 1931500300mm
31061170B
SLAM 193 Parent Bulk
31061170B
SLAM 193 Parent Bulk
84421
SLAM 193e 300mm 25L L94L
84421
SLAM 193e 300mm 25L L94L
94609
SLAM 193e80
94609
SLAM 193e80
95496
SLAM193e80F10N 125 L L96L
95496
SLAM193e80F10N 125 L L96L
Image
SKU
Description
107102
SLAM193e150F10N 125L US
107102
SLAM193e150F10N 125L US
31061160B
SLAM 1931500300mm
31061160B
SLAM 1931500300mm
31061170B
SLAM 193 Parent Bulk
31061170B
SLAM 193 Parent Bulk
84421
SLAM 193e 300mm 25L L94L
84421
SLAM 193e 300mm 25L L94L
94609
SLAM 193e80
94609
SLAM 193e80
95496
SLAM193e80F10N 125 L L96L
95496
SLAM193e80F10N 125 L L96L
